What is Scatterometry in semiconductor?

Scatterometry is an optical. dimensional metrology based on the analysis of light. scattered from periodic features made during the wafer. fabrication process.

What is metrology in semiconductor industry?

Metrology 1： Measurement of the line width and hole diameter of a circuit pattern at a specified location of a semiconductor wafer (CD-SEM).

What is scatterometry metrology?

Scatterometry is a metrology technique that combines the sensitivity of diffraction from periodic structures with a first principle solution of electromagnetic wave diffraction from these structures.

What is metrology ASML?

Types of metrology and inspection ASML uses both: our YieldStar systems use diffraction-based measuring to assess the pattern quality on the wafer, and HMI e-beam inspection systems help locate and analyze individual chip defects.

What is optical scatterometry?

Optical Scatterometry is a method of characterizing unknown properties of a sample by measuring the reflection of broadband light from an object. The reflection varies by wavelength (color), polarization, and angle-of-incidence.

How does a satellite scatterometer work?

Scatterometers are active remote sensing instruments for deriving wind direction and speed from the roughness of the sea. They are used by low Earth orbiting satellites and act like radars: they transmit electromagnetic pulses and detect the backscattered signals.

What is a metrology inspector?

Perform duties to inspect, production, metrology and other measuring instruments; provide accuracy of gauging in aspect of product process and inspection, metrology and analysis; maintain, issue and…

How does ellipsometry work?

Ellipsometry measures a change in polarization as light reflects or transmits from a material structure. The polarization change is represented as an amplitude ratio, Ψ, and the phase difference, Δ. The measured response depends on optical properties and thickness of individual materials.

What is k1 in lithography?

The k1 factor indicates the difficulty of the lithography process; it is determined by the target design rule, numerical aperture (NA), and laser exposure wavelength according to the following formula: k1 = Design Rule * NA of Lithography Tool/Laser Exposure Wavelength.

What is E beam inspection?

In an e-beam inspection system, the stage moves the wafer to a given location. Then, the electrons hit a small spot size on the wafer. The image data is then collected on a pixel-by-pixel basis. Traditionally, e-beam inspection has been used for voltage contrast and physical defect applications.

Is scatterometer a radar?

Scatterometers are radars and send pulses of radiation at the surface. The backscattered signal varies according to the wind speed and its effects on ocean roughness.

What is scatterometry used for in metrology?

In the past few years, scatterometry has emerged as a method for performing linewidth and line profile metrology, especially by the semiconductor industry. The method uses a periodic target containing repetitive lines whose profile, i.e., its width, height, and shape, is to be determined.

Is scatterometry ready for mainstream silicon applications?

•Scatterometry is mature and ready for mainstream silicon applications –Variety of methods and techniques which all work well •Lithography control applications are especially compelling –Rapid, precise, complete measurements –Focus, dose, leveling, aberrations, bake, CD control… •Etch applications also provide significant

When was the first scatterometer developed?

principle scatterometer was developed. 1990 – Focus and dose control investigated. 1993 – Patterned CD measurements investigated. 1995 – Sandia Systems develops/markets CDS-1. Tool/process validated by SEMATECH, TI. 1996 – Sandia Systems acquired by Bio-Rad. 1998 – First sales and shipments of CDS-2.

What are the limits of scatterometry?

The limits of scatterometry, in terms of how long it will remain a viable solution to the semiconductor industry’s needs as device dimensions are reduced, are unknown. It is essential that these limits be determined so that the industry can develop alternative solutions.